Translator Disclaimer
Paper
20 October 2000 Overview of reticle enhancement technology software strategy
Author Affiliations +
Proceedings Volume 4226, Microlithographic Techniques in Integrated Circuit Fabrication II; (2000) https://doi.org/10.1117/12.404842
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore
Abstract
Although RET software technology has made great advances in recent years, very little attention has been paid to how this technology can be put into reliable and efficient use in a production environment. To stimulate EDA suppliers to take up this task, a system for not only automating RET, but also for generalizing the automation of RET is described.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alfred J. Reich, R. D. Jarvis, Steve Talent, and Renee Carter "Overview of reticle enhancement technology software strategy", Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); https://doi.org/10.1117/12.404842
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Designing to win in sub-90nm mask production
Proceedings of SPIE (November 07 2005)
Mask design rules (45 nm): time for standardization
Proceedings of SPIE (November 09 2005)
The rising cost and complexity of RETs
Proceedings of SPIE (May 03 2004)
Defect printability in CPL mask technology
Proceedings of SPIE (May 28 2004)

Back to Top