Paper
20 October 2000 Patternable hybrid sol-gel glass
Author Affiliations +
Proceedings Volume 4226, Microlithographic Techniques in Integrated Circuit Fabrication II; (2000) https://doi.org/10.1117/12.404848
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore
Abstract
The hybrid sol-gel materials have been extensively studied and widely used in the fabrication of optical devices due to their attractive properties. In this work, the synthesis of the UV sensitive organic- inorganic SiO2/TiO2 sol-gel glass is presented. The effect of the fabrication parameters such as doping concentration, bake temperature and UV light exposure time on the film characteristics (thickness and refractive index) are studied. A simple way of patterning the material by UV light radiation is also introduced. These demonstrate the material possesses high potential application for the micro-optics device fabrication.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
HongJin Jiang, XiaoCong Yuan, Yuen Chuen Chan, and Yee Loy Lam "Patternable hybrid sol-gel glass", Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); https://doi.org/10.1117/12.404848
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KEYWORDS
Sol-gels

Glasses

Ultraviolet radiation

Refractive index

Photomasks

Etching

Holography

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