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20 October 2000 Simulation of resolution enhancement in contact lithography by off-axis illumination
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Proceedings Volume 4226, Microlithographic Techniques in Integrated Circuit Fabrication II; (2000) https://doi.org/10.1117/12.404850
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore
Abstract
Intensity distribution on the wafer plane in contact printing system under off-axis illumination is derived based on the amplitude analytic expression for Fresnel-Kirchhoff diffraction. Numerical simulations have been done under various conditions. Resolution enhancement effects by off-axis illumination and its application are analyzed.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yongkai Zhao, Huijie Huang, Dunwu Lu, Longlong Du, Cailai Yuan, Baocai Jiang, and Runwen Wang "Simulation of resolution enhancement in contact lithography by off-axis illumination", Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); https://doi.org/10.1117/12.404850
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