Paper
6 April 2001 Protein and cell patterning using bilayer lithography and confocal microscopy
Author Affiliations +
Proceedings Volume 4234, Smart Materials; (2001) https://doi.org/10.1117/12.424413
Event: Smart Materials and MEMS, 2000, Melbourne, Australia
Abstract
Protein patterns were printed using conventional microlithographic materials in a bilayer arrangement and unconventional exposure tools. The bilayer resist stack consists of a bottom Poly(tertButylMethAcrylate) layer and a top DNQ-novolak layer. The protein features were printed in 'step & repeat' mode, that is a flow-cell, 'real-time' process, as follows: (1) the exposure step is carried out by the focused beam of a confocal microscope tuned to 488 nm wavelength; (2) the development step is performed flowing the photoresist developer through the cell; (3) the selective deposition of the protein (a green fluorescent protein, FITC avidin for visualization) is achieved via the flow of the protein solution through the cell until a desired contrast has been reached; (4) the control step consists of an on-line monitoring of the red fluorescence for the control of the development of the top layer, and of the green fluorescence for the control of the protein patterning. respectively. The techniques have of a seamless portability in a biomedical environment, and for 'step & repeat' protein patterning the advantage of a high and controllable resolution. The process can be applied for the in-house fabrication of model biomolecular and cellular devices. Examples for the patterning of neuronal cells are also given.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dan V. Nicolau, Robert A. Cross, and Takahisa Taguchi "Protein and cell patterning using bilayer lithography and confocal microscopy", Proc. SPIE 4234, Smart Materials, (6 April 2001); https://doi.org/10.1117/12.424413
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KEYWORDS
Proteins

Confocal microscopy

Optical lithography

Microscopes

Lithography

Photoresist developing

Photoresist materials

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