PLD of hard ceramic coatings

Yibran Perera; Jens Gottmann; Andreas Husmann; Thomas Klotzbuecher; Ernst-Wolfgang Kreutz; Reinhart Poprawe

doi:10.1117/12.432550

29 June 2001 PLD of hard ceramic coatings

Yibran Perera, Jens Gottmann, Andreas Husmann, Thomas Klotzbuecher, Ernst-Wolfgang Kreutz, Reinhart Poprawe

Proceedings Volume 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI; (2001) https://doi.org/10.1117/12.432550
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

The deposition of different hard ceramics coatings as Al₂O₃, ZrO₂, c-BN and DLC thin films by pulsed laser deposition (PLD) has been of increasing interest as alternative process compared to the latest progress in CVD and PVD deposition. For instance, in pulsed laser deposition, the properties of the resulting thin films are influenced by the composition, ionization state, density, kinetic and excitation energies of the particles of the vapor/plasma. In order to deposit hard ceramics with different properties and applications, various substrates as Pt/Ti/Si multilayer, glass (fused silica), steel, polymethylmethacrylate (PMMA), polycarbonate (PC), Si(100) and Si(111) are used. These thin films are deposited either by excimer laser radiation ((lambda) equals 248 nm) or by CO₂ laser radiation ((lambda) equals 10.6 micrometers ). To characterize the structural, optical and mechanical properties of the hard ceramics thin films, different techniques as Raman spectroscopy, ellipsometry, FTIR spectroscopy and nanoindentation are used.

Citation Download Citation

Yibran Perera, Jens Gottmann, Andreas Husmann, Thomas Klotzbuecher, Ernst-Wolfgang Kreutz, and Reinhart Poprawe "PLD of hard ceramic coatings", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432550

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