Paper
17 May 2001 Metal-semiconductor-metal photodetectors
Author Affiliations +
Abstract
MSM photodiodes attracted attention due to their high-speed performance and ease of integration, but this interest has waned recently. This paper endeavors to explore why this occurred and tries to address these issues. MSM photodiodes have a much lower capacitance per unit area than p-i-n photodiodes, and are often transit time limited. MSM photodiodes are comprised of back-to-back Schottky diodes using an interdigitated electrode configuration on top of an active light collection region. The transit time is related to the spacing between these interdigitated electrodes. MSM photodiodes are more easily integrated with pre-amplifier circuitry than p-i-n photodiodes. One reason is that MSM photodiodes do not require doping which eliminates any parasitic capacitive coupling between the photodiode and doped regions within the active transistors. Another reason is that the Schottky electrodes of the MSM photodiodes are essentially identical to the gate metallization of field effect transistors (FET), which might eliminate one photolithography step. But, MSM photodiodes suffer from very low external quantum efficiency (EQE) and high leakage currents. MSM photodiodes exhibit low EQE because the metallization for the electrodes shadows the active light-collecting region. Shadowing can limit the incident light from reaching the active region of the MSM detector and prevent an ideal MSM from achieving high EQE. Transparent conductors have been shown to nearly double responsivity. Leakage currents are determined primarily by the Schottky barrier heights. These can be unreliable. However, thin wide bandgap cap layers can be inserted below the Schottky and different metals used for the anode and cathode to break symmetry and to circumnavigate these concerns.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul Raymond Berger "Metal-semiconductor-metal photodetectors", Proc. SPIE 4285, Testing, Reliability, and Applications of Optoelectronic Devices, (17 May 2001); https://doi.org/10.1117/12.426888
Lens.org Logo
CITATIONS
Cited by 9 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photodiodes

Electrodes

Semiconductors

Field effect transistors

Photodetectors

PIN photodiodes

Capacitance

RELATED CONTENT

High-gain GaAs MSM photodetector
Proceedings of SPIE (December 16 1992)
Modeling of PSD based on Schottky-barrier junction
Proceedings of SPIE (January 17 2005)
Mixed metal oxide films as pH sensing materials
Proceedings of SPIE (May 15 2007)
Germanium on silicon photodetectors for telecom wavelengths
Proceedings of SPIE (February 14 2007)
High Transconductance OGFETs
Proceedings of SPIE (April 22 1987)

Back to Top