Surface-micromachined 2D optical scanners with optically flat single-crystalline silicon micromirrors

John GuoDung Su; Pamela Rae Patterson; Ming C. Wu

doi:10.1117/12.426942

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18 May 2001 Surface-micromachined 2D optical scanners with optically flat single-crystalline silicon micromirrors

John GuoDung Su, Pamela Rae Patterson, Ming C. Wu

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Proceedings Volume 4293, Silicon-based and Hybrid Optoelectronics III; (2001) https://doi.org/10.1117/12.426942
Event: Symposium on Integrated Optics, 2001, San Jose, CA, United States

Abstract

We have developed a novel wafer-scale single-crystalline silicon micromirror bonding process to fabricate optically flat micromirrors on polysilicon surface-micromachined 2D scanners. The electrostatically actuated 2D scanner has a mirror area of 450 micrometers x 450 micrometers and an optical scan angle of +/- ±7.5 degree(s). Compared to micromirrors made with a standard polysilicon surface-micromachining process, the radius of curvature of the micromirror has been improved by 1 50 times from 1.8 cm to 265 cm, with surface roughness < 10 nm. Besides, single-crystalline honeycomb micromirrors derived from silicon on insulator (SOI) have been developed to reduce the mass of the bonded mirror.

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John GuoDung Su, Pamela Rae Patterson, and Ming C. Wu "Surface-micromachined 2D optical scanners with optically flat single-crystalline silicon micromirrors", Proc. SPIE 4293, Silicon-based and Hybrid Optoelectronics III, (18 May 2001); https://doi.org/10.1117/12.426942

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