Optimal lithium targets for laser-plasma lithography

Alexander A. Andreev; T. Ueda; Jiri Limpouch

doi:10.1117/12.436706

20 August 2001 Optimal lithium targets for laser-plasma lithography

Alexander A. Andreev, T. Ueda, Jiri Limpouch

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436706
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Lithium containing droplet and cluster targets irradiated by laser pulses are proposed as prospective source of for soft x-ray lithography. Analytical model and simulations show that laser with repetition rate of several MHz with energy of several mJ and pulse duration 10 ps is required.

Citation Download Citation

Alexander A. Andreev, T. Ueda, and Jiri Limpouch "Optimal lithium targets for laser-plasma lithography", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436706

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