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24 August 2001 Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions
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A novel process for the preparation of hybrid copolymers based on cycloolefin-maleic anhydride and methacrylate (COMA/Methacrylate) monomers has been developed. A variety of copolymers have been synthesized form t-butylnorbonene carboxylate (BNC), hydroxyethylnorbornene carboxylate (HNC), and norbornene carboxylic acid (NC) with different types of methacrylate monomers such as 2-methyl-2-adamantyl- methacrylate(MAdMA), mevalonic lactone methacrylate(MLMA) and maleic anhydride (MA). The effect of the different types of monomers and the ratios of monomers in the copolymer on lithographic performance has been studied. Lithographic evaluation of some of these polymers has shown resolution down to 80nm for semi and fully isolated lines using conventional 193nm illumination and standard development conditions. This paper will report the chemistry of the hybrid polymer platforms and the progress of our effort to develop 193 resist for semi-dense and isolated line applications.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Dalil Rahman, Douglas S. McKenzie, Jun-Bom Bae, Takanori Kudo, Woo-Kyu Kim, Munirathna Padmanaban, and Ralph R. Dammel "Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001);

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