Polymer design for 157-nm chemically amplified resists

Hiroshi Ito; Gregory M. Wallraff; Phillip J. Brock; Nicolette Fender; Hoa D. Truong; Gregory Breyta; Dolores C. Miller; Mark H. Sherwood; Robert D. Allen

doi:10.1117/12.436857

24 August 2001 Polymer design for 157-nm chemically amplified resists

Hiroshi Ito, Gregory M. Wallraff, Phillip J. Brock, Nicolette Fender, Hoa D. Truong, Gregory Breyta, Dolores C. Miller, Mark H. Sherwood, Robert D. Allen

Author Affiliations +

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436857
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Based on UV measurements at 157nm of in-house fluoropolymers we have selected (alpha) -trifluoromethylacrylate and norbornene bearing a pendant hexafluoroisopropanol group as our building blocks for 157nm resist polymers. Polymers consisting of these repeat units have an optical density/micrometers of 3 or below at 157nm. We have found that the (alpha) -trifluoromethylacrylate derivatives conveniently undergo radical copolymerization with norornenes, which has provided a breakthrough in preparation of our 157nm resist polymers. This approach offers flexibility and versatility because an acidic moiety or acid-labile group can be placed in either acrylate or norbornene repeat unit. Other platforms of interest include all acrylic, all-norbornene, and acrylic-styrenic polymers.

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Hiroshi Ito, Gregory M. Wallraff, Phillip J. Brock, Nicolette Fender, Hoa D. Truong, Gregory Breyta, Dolores C. Miller, Mark H. Sherwood, and Robert D. Allen "Polymer design for 157-nm chemically amplified resists", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436857

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