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24 August 2001 Polymer design for 157-nm chemically amplified resists
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Based on UV measurements at 157nm of in-house fluoropolymers we have selected (alpha) -trifluoromethylacrylate and norbornene bearing a pendant hexafluoroisopropanol group as our building blocks for 157nm resist polymers. Polymers consisting of these repeat units have an optical density/micrometers of 3 or below at 157nm. We have found that the (alpha) -trifluoromethylacrylate derivatives conveniently undergo radical copolymerization with norornenes, which has provided a breakthrough in preparation of our 157nm resist polymers. This approach offers flexibility and versatility because an acidic moiety or acid-labile group can be placed in either acrylate or norbornene repeat unit. Other platforms of interest include all acrylic, all-norbornene, and acrylic-styrenic polymers.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroshi Ito, Gregory M. Wallraff, Phillip J. Brock, Nicolette Fender, Hoa D. Truong, Gregory Breyta, Dolores C. Miller, Mark H. Sherwood, and Robert D. Allen "Polymer design for 157-nm chemically amplified resists", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001);

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