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14 September 2001 Alternating PSM mask performance: a study of multiple fabrication technique results
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Abstract
In this paper we will discuss the results obtained from five alternating aperture phase-shifting masks (altPSM), each with an identical layout but manufactured using a different technique. We will show the results obtained for mask CD performance measured on a SEM for a number of dimensions and duty cycles. We will show how the results obtained from conventional mask metrology compare with results from advanced analysis including mask topography information obtained using an automated atomic force microscope (AFM). Comparison will be made showing how the metrology structures on the mask compare to the actual structures in the patterning area. A comparison of the results achieved from each mask manufacturing technique will also be made.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin McCallum, Patricia Gabella, Gilbert V. Shelden, Kevin Kjoller, and Edward Kirk Miller "Alternating PSM mask performance: a study of multiple fabrication technique results", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435771
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