Detection of focus and spherical aberration by use of a phase grating

Joseph P. Kirk; Scott Schank; Chieh-yu Lin

doi:10.1117/12.435673

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14 September 2001 Detection of focus and spherical aberration by use of a phase grating

Joseph P. Kirk, Scott Schank, Chieh-yu Lin

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Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435673
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

A phase only grating consisting of equal lines of 0 and 90 degree phase is imaged into a highly absorbing photoresist forming a surface relief grating that is measured with a dark- field optical microscope and a CCD array. The resulting images are analyzed to determine spherical aberration, +-0.001 wave RMS, and focus variations of +-2.0 nm. This method of measurement and analysis is applied to both 248 and 193 nm photolithography lenses.

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Joseph P. Kirk, Scott Schank, and Chieh-yu Lin "Detection of focus and spherical aberration by use of a phase grating", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435673

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