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14 September 2001 LAVA web-based remote simulation: enhancements for education and technology innovation
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The Lithography Analysis using Virtual Access (LAVA) web site at has been enhanced with new optical and deposition applets, graphical infrastructure and linkage to parallel execution on networks of workstations. More than ten new graphical user interface applets have been designed to support education, illustrate novel concepts from research, and explore usage of parallel machines. These applets have been improved through feedback and classroom use. Over the last year LAVA provided industry and other academic communities 1,300 session and 700 rigorous simulations per month among the SPLAT, SAMPLE2D, SAMPLE3D, TEMPEST, STORM, and BEBS simulators.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo H. Croffie, Yunfei Deng, Frank E. Gennari, Thomas V. Pistor, Garth Robins, Mike V. Williamson, Bo Wu, Lei Yuan, and Andrew R. Neureuther "LAVA web-based remote simulation: enhancements for education and technology innovation", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001);

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