Random pattern formation by attenuated non-phase-shift assist pattern mask

Shuji Nakao; Akira Tokui; Kouichirou Tsujita; Ichiriou Arimoto; Wataru Wakamiya

doi:10.1117/12.435777

14 September 2001 Random pattern formation by attenuated non-phase-shift assist pattern mask

Shuji Nakao, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto, Wataru Wakamiya

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435777
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

A novel resolution enhancement technology (RET) for random pattern formation which utilizes attenuating non-phase-shift (Atten-NPS) assist pattern is proposed based on optical image calculation. By addition of Atten NPS assist pattern whose size is comparable to that of main pattern, much improvement of imaging characteristics is obtained for isolated feature under modified illumination. Modified illumination is optimized both for hole and line pattern. Also, transmission of Atten-NPS aperture is optimized to enhance imaging characteristics and not to be printed on resist. In the application of this RET, aperture size of assist pattern on mask can make similar to that of main pattern. Consequently, difficulty in mask fabrication for conventional assist pattern method , such as pattern delineation and defect inspection, will be overcome.

Citation Download Citation

Shuji Nakao, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto, and Wataru Wakamiya "Random pattern formation by attenuated non-phase-shift assist pattern mask", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435777

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