Paper
14 September 2001 Roles of NA, sigma, and lambda in low-k1 aerial image formation
Peter D. Brooker
Author Affiliations +
Abstract
The purpose of this paper is to introduce the fundamental concepts needed to understand the roles of NA, sigma and lambda in aerial image formation for low k1 equals CD/((lambda) /NA) applications. Starting with an idealized representation of the condenser and projection optics in a stepper, the definitions of NA and sigma will be rigorously developed. Next the aerial image will be related to source illumination pattern at the objective pupil that includes the effect of diffraction by the reticle. The initial case considered will be for dense lines and spaces. Off Axis Illumination OAI will then be presented to show exactly what it is and how it can result in increased resolution. The cases of semi-isolated lines and spaces are also be addressed. Also included will be a detailed derivation of the diffraction equations for dense lines and spaces not found in text books.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter D. Brooker "Roles of NA, sigma, and lambda in low-k1 aerial image formation", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435713
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Diffraction

Objectives

Reticles

Light sources

Semiconducting wafers

Far-field diffraction

Image acquisition

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