Removal process for buffer layer on multilayer of EUVL mask

Eiichi Hoshino; Taro Ogawa; Masashi Takahashi; Hiromasa Hoko; Hiromasa Yamanashi; Naoya Hirano; Akira Chiba; Byoung Taek Lee; Masaaki Ito; Shinji Okazaki

doi:10.1117/12.425097

9 April 2001 Removal process for buffer layer on multilayer of EUVL mask

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Naoya Hirano, Akira Chiba, Byoung Taek Lee, Masaaki Ito, Shinji Okazaki

Author Affiliations +

Proceedings Volume 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2001) https://doi.org/10.1117/12.425097
Event: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2000, Munich, Germany

Abstract

To obtain a stable pattern profile for the SiO₂ buffer layer of an EUVL (Extreme Ultraviolet Lithography) mask, the process latitude available under actual manufacturing conditions was examined by using a conventional spin wet etcher and trying to make the etching depth as uniform as possible. Generally, wet etching uniformity depends on the sequence of the paddling and swing of the etchant nozzle. A uniformity of 1.5%, which meets manufacturing requirements, was found to be obtainable with a special nozzle. This report details a process scheme for removing the buffer layer on the multilayer of an EUVL mask, and presents a method of inspecting the buffer layer along with some simulation results on the printability of residues near the pattern edge.

Citation Download Citation

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Naoya Hirano, Akira Chiba, Byoung Taek Lee, Masaaki Ito, and Shinji Okazaki "Removal process for buffer layer on multilayer of EUVL mask", Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); https://doi.org/10.1117/12.425097

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available