Some measurements on the effects of developer depletion

Brian Martin; Tom Tighe

doi:10.1117/12.425249

20 April 2001 Some measurements on the effects of developer depletion

Brian Martin, Tom Tighe

Proceedings Volume 4405, Process and Equipment Control in Microelectronic Manufacturing II; (2001) https://doi.org/10.1117/12.425249
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom

Abstract

This work describes assessment of `long range' and `short range' developer depletion using production and test reticles respectively. Long range developer depletion refers to the case where development of large unpatterned field areas remote from critical dimensions influences their size, whether the field areas are exposed or unexposed. Results show no significant effect at the 0.35 micron scale. Short range developer depletion refers to the case, on test reticles, where single lines are defined in large open field areas or in a small open box set within a dark field area. Differences in CD's can be readily measured on test reticles and attributed to the effects of developer depletion.

Citation Download Citation

Brian Martin and Tom Tighe "Some measurements on the effects of developer depletion", Proc. SPIE 4405, Process and Equipment Control in Microelectronic Manufacturing II, (20 April 2001); https://doi.org/10.1117/12.425249

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available