Advanced FIB mask repair technology for ArF lithography: III

Ryoji Hagiwara; Anto Yasaka; Osamu Takaoka; Tomokazu Kozakai; S. Yabe; Yoshihiro Koyama; Masashi Muramatsu; Toshio Doi; Kenji Suzuki; Mamoru Okabe; Kazuo Aita; Tatsuya Adachi; Shinji Kubo; Nobuyuki Yoshioka; Hiroaki Morimoto; Yasutaka Morikawa; Kazuya Iwase; Naoya Hayashi

doi:10.1117/12.438373

5 September 2001 Advanced FIB mask repair technology for ArF lithography: III

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, S. Yabe, Yoshihiro Koyama, Masashi Muramatsu, Toshio Doi, Kenji Suzuki, Mamoru Okabe, Kazuo Aita, Tatsuya Adachi, Shinji Kubo, Nobuyuki Yoshioka, Hiroaki Morimoto, Yasutaka Morikawa, Kazuya Iwase, Naoya Hayashi

Author Affiliations +

Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438373
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan

Abstract

The design rule of the semiconductor devices is getting dramatically tighter as the progress of lithography technology. Photomask is a key factor to support the lithography technology. Defect repairing technology becomes more important than ever for keeping the photomasks' integrity in the manufacturing processes. When using conventional FIB, however, there are issues of transmission loss due to riverbed and gallium stain for opaque defect repairs as well as the problem raised by halo around repair areas for clear defect repairs. Because of these issues, it is necessary to develop the new FIB mask repairing system for 130nm node. We have been developing the new FIB mask repair system since 1998 and have been testing the repairing performance. The results were published at both PMJ2000 and BACUS2000. This time, we introduce the prototype system's outline, and report preliminary data of imaging damage and repair accuracy for the first time in public.

Citation Download Citation

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, S. Yabe, Yoshihiro Koyama, Masashi Muramatsu, Toshio Doi, Kenji Suzuki, Mamoru Okabe, Kazuo Aita, Tatsuya Adachi, Shinji Kubo, Nobuyuki Yoshioka, Hiroaki Morimoto, Yasutaka Morikawa, Kazuya Iwase, and Naoya Hayashi "Advanced FIB mask repair technology for ArF lithography: III", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438373

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE