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5 September 2001 Elongation effect of a protecting layer for film life of chemically amplified-type e-beam resist
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Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438352
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan
Abstract
Several kinds of hydrophobic or hydrophilic polymers were evaluated in order to survey what kind of polymer improved the film life of chemically amplified resist(CAR) when it's used as a protecting layer. Hydrophilic polymers such as polyacrylic acid(PAA), polyethyleneglycol(PEG) and polyvinyl alcohol(PVA) were not good materials for this purpose, because they couldn't maintain resist property during their storage. Polyolefin(ZEP-AF) was the best polymer, though it caused slightly rough surface of resist patterns.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kakuei Ozawa and Nobunori Abe "Elongation effect of a protecting layer for film life of chemically amplified-type e-beam resist", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438352
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