Laser mask repair system LM700A

Atsushi Ueda; Yoichi Yoshino; Yukio Morishige; Syuichi Watanabe; Yukio Kyusho; Tsutoma Haneda; Makoto Ohmiya

doi:10.1117/12.438390

5 September 2001 Laser mask repair system LM700A

Atsushi Ueda, Yoichi Yoshino, Yukio Morishige, Syuichi Watanabe, Yukio Kyusho, Tsutoma Haneda, Makoto Ohmiya

Author Affiliations +

Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438390
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan

Abstract

High throughput laser mask repair system satisfying the accuracy demanded for 0.5micrometers pattern rule reticles has been newly developed. The named Laser Mask Repair LM700A has the following versatile features: *Opaque defect repair capability of 0.5micrometers L&S patterns with high repair accuracy of 45nm (3(sigma) ) *Low Quartz damage and high transmission at the repair site, especially for MoSi KrF-HT mask, and applicable to MoSi ArF-HT mask, by newly developed pico-second solid state UV pulse laser *0.1micrometers defect detectability by high resolution UV Optics *Through pellicle repair capability by newly developed long working distance UV objective lens *Auto-edge positioning function for various patterns By utilizing a pico-second UV pulse laser, very high quality laser zapping can be obtained. This paper presents the configuration and the evaluated results for mask repair performance in MoSi KrF-HT and ArF-HT masks.

Citation Download Citation

Atsushi Ueda, Yoichi Yoshino, Yukio Morishige, Syuichi Watanabe, Yukio Kyusho, Tsutoma Haneda, and Makoto Ohmiya "Laser mask repair system LM700A", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438390

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