Longevity of 193-nm/ArF excimer pellicle

Takashi Kozeki; Shigeto Shigematsu; Masahiro Kondo; Hiroaki Nakagawa

doi:10.1117/12.438394

5 September 2001 Longevity of 193-nm/ArF excimer pellicle

Takashi Kozeki, Shigeto Shigematsu, Masahiro Kondo, Hiroaki Nakagawa

Author Affiliations +

Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438394
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan

Abstract

Influences of Environment for Pellicle: We irradiated ArF laser in the fluorine polymer membrane set into the atmosphere that mixed artificial air and organic vapor. We obtained the following finding: 1) Organic compounds in the environment had a harmful influence to pellicle. 2) the longevity of the pellicle depended on the kind of the organic compounds. 3) P-Xylene had as 300 times as harmful influence of IPA to pellicle. Influences of Mask Cases for quartz substrate: We set the quartz substrate into the various Mask cases and heated it for 40 degree(s)C, 3 days. After that we checked the change of the transmission rate, the sulfuric acid ion concentration, and ArF laser dosed area. We obtained the following findings: 1)All the Mask Case we investigated had harmful influence to quartz substrate *Transmission reduction of substrate *Haze generation by ArF laser exposure 2) Haze substance was ammonium sulfate or organic compound. By using heat treated cases, the above faultiness was reduced.

Citation Download Citation

Takashi Kozeki, Shigeto Shigematsu, Masahiro Kondo, and Hiroaki Nakagawa "Longevity of 193-nm/ArF excimer pellicle", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438394

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