RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography

Stephen Hsu; Xuelong Shi; Chungwei Michael Hsu; Noel P. Corcoran; J. Fung Chen; Sunil Desai; Micheal J. Sherrill; Y. C. Tseng; H. A. Chang; J. F. Kao; Alex Tseng; WeiJyh Liu; Anseime Chen; Arthur Lin; Jan Pieter Kujten; Eric Jacobs; Arjan Verhappen

doi:10.1117/12.438410

5 September 2001 RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography

Stephen Hsu, Xuelong Shi, Chungwei Michael Hsu, Noel P. Corcoran, J. Fung Chen, Sunil Desai, Micheal J. Sherrill, Y. C. Tseng, H. A. Chang, J. F. Kao, Alex Tseng, WeiJyh Liu, Anseime Chen, Arthur Lin, Jan Pieter Kujten, Eric Jacobs, Arjan Verhappen

Author Affiliations +

Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438410
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan

Abstract

For cost effective 130nm node manufacturing, it is prefer to use KrF binary chrome mask. To realize a production worth process for making random logic device, we need to effectively control mask error enhancement factor (MEEF) through pitch. In low k1 lithography, process parameters such as focus, lens aberration, linewidth, and line pitch, style of proximity correction (OPC), and resist process conditions, etc., all impact MEEF. We show a powerful RuMBa OPC method that can reduce MEEF to an acceptable level (close to 1(using KrF resist process. We believe that RuMBa OPC method can be further extended for sub 100nm ArF process. In wafer printing experiment, we have designed a new style of LineSweeper reticles for our lithography process optimization. Both simulated and printed wafer CD data were used to calculate the overlapped process window along with respective MEEF. These are the metric we used to assess the 130nm process performance. Using RuMBa OPC, we are able to achieve overlapped process window that is sufficient for 130nm gate mask process. The CD through pitch calibration is critical for an accurate model-based correct at location where OPC rule cannot cover. A high accuracy CD through pitch calibration methodology is developed for model calibration. In this paper, we have compared the 130nm performance using KrF binary mask, KrF 6% attenuated PSM, and ArF binary mask.

Citation Download Citation

Stephen Hsu, Xuelong Shi, Chungwei Michael Hsu, Noel P. Corcoran, J. Fung Chen, Sunil Desai, Micheal J. Sherrill, Y. C. Tseng, H. A. Chang, J. F. Kao, Alex Tseng, WeiJyh Liu, Anseime Chen, Arthur Lin, Jan Pieter Kujten, Eric Jacobs, and Arjan Verhappen "RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438410

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
14 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Optical proximity correction

Photoresist processing

Binary data

Reticles

Semiconducting wafers

Electroluminescence

Show All Keywords

Keywords/Phrases

Search In:

Publication Years