Simulation-based defect printability analysis for 0.13-um technology

Cihan Tinaztepe; Ichiro Kagami

doi:10.1117/12.438363

5 September 2001 Simulation-based defect printability analysis for 0.13-μm technology

Cihan Tinaztepe, Ichiro Kagami

Author Affiliations +

Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438363
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan

Abstract

This paper describes quantitative evaluation result of a new printability analysis system Printability Analysis Stepper Simulator (PASS).

Citation Download Citation

Cihan Tinaztepe and Ichiro Kagami "Simulation-based defect printability analysis for 0.13-μm technology", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438363

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