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5 September 2001 Simulation-based defect printability analysis for 0.13-μm technology
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Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438363
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan
Abstract
This paper describes quantitative evaluation result of a new printability analysis system Printability Analysis Stepper Simulator (PASS).
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Cihan Tinaztepe and Ichiro Kagami "Simulation-based defect printability analysis for 0.13-μm technology", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438363
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