Characterization of fused silica ablation by F2-KrF excimer laser multiwavelength excitation process

Kotaro Obata; Koji Sugioka; Toshimitsu Akane; Naoko Aoki; Koichi Toyoda; Katsumi Midorikawa

doi:10.1117/12.456895

25 February 2002 Characterization of fused silica ablation by F₂-KrF excimer laser multiwavelength excitation process

Kotaro Obata, Koji Sugioka, Toshimitsu Akane, Naoko Aoki, Koichi Toyoda, Katsumi Midorikawa

Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456895
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore

Abstract

The novel technique for high-quality ablation and high- efficiency refractive index modification of fused silica by VUV-UV multiwavelength excitation process has been developed, in which both of the commercially available F₂ and KrF excimer lasers are simultaneously irradiated to the sample. The high-quality ablation is ascribed to absorption of KrF excimer laser by excited states formed by F₂ laser (excited-state absorption mechanism). Dependences of ablation rate on KrF excimer laser fluence at three deferent F₂ laser fluences and irradiation timing of each laser beam are investigated. The multiwavelength excitation process is also applied for effective refractive index change. The multiwavelength excitation process achieves twice of diffraction efficiency compared with single wavelength irradiation of F₂ laser at same number of incident total photon number. This is caused by the resonance photoionization-like process through the excited state.

Citation Download Citation

Kotaro Obata, Koji Sugioka, Toshimitsu Akane, Naoko Aoki, Koichi Toyoda, and Katsumi Midorikawa "Characterization of fused silica ablation by F₂-KrF excimer laser multiwavelength excitation process", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); https://doi.org/10.1117/12.456895

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