High-resolution laser flash photography for probing the solidification of the new double laser recrystallization process

Ming-Hong Lee; Seung-Jae Moon; Mutsuko Hatano; Constantine P. Grigoropoulos

doi:10.1117/12.456858

25 February 2002 High-resolution laser flash photography for probing the solidification of the new double laser recrystallization process

Ming-Hong Lee, Seung-Jae Moon, Mutsuko Hatano, Constantine P. Grigoropoulos

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Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456858
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore

Abstract

A new double laser recrystallization technique that can produce lateral grains of tens of micrometers is presented. A nanosecond laser (excimer or Nd:YLF laser) and a pulse modulated Ar^PLU laser are used in the experiment. The effect of different parameters on lateral grain growth is investigated. These parameters include the time delay between the two lasers, the excimer laser fluence, the Ar^PLU laser power and the pulse duration. This process has wide process window and is insensitive to both the excimer laser fluence and the Ar^PLU laser power fluctuations. Preheating and melting of the a-Si film with the Ar^PLU laser before firing the excimer laser is found to be necessary for inducting lateral grain growth. The transient excimer laser irradiation is believed to generate nucleation sites for initiating the subsequent lateral grain growth. The solidification dynamics of the process is probed by high spatial and temporal resolution laser flash photography. A lateral solidification velocity of about 10m/s observed.

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Ming-Hong Lee, Seung-Jae Moon, Mutsuko Hatano, and Constantine P. Grigoropoulos "High-resolution laser flash photography for probing the solidification of the new double laser recrystallization process", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); https://doi.org/10.1117/12.456858

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KEYWORDS

Excimer lasers

Argon ion lasers

Pulsed laser operation

Amorphous silicon

Neodymium lasers

Photography

Solids

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