Paper
29 June 2001 Fundamental aspects of photochemical effects in UV laser ablation
Athanasia Athannassiou, D. Fragouli, Efi Andreou, Dmitrios Anglos, Savas K. Georgiou, Costas Fotakis
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Proceedings Volume 4430, ROMOPTO 2000: Sixth Conference on Optics; (2001) https://doi.org/10.1117/12.432834
Event: ROMOPTO 2000: Sixth Conference on Optics, 2000, Bucharest, Romania
Abstract
The photochemical effects induced by UV irradiation at 248 nm to highly photosensitive organic compounds embedded into polymer matrices are sutdied in a systematic way using laser induced fluorescence. The nature and intensity of the induced photoproducts are monitored below and above the ablation threshold. Host polymers with different absorption coefficients in the employed wavelength are used in order to study their protective role with regard to the photodissociation of the dopants. The employed dopants are the iodo-derivatives of naphthalene and phenanthrene (NapI and PhenI). Photolysis of the dopants, while they are embedded int he weakly absorbing polymer PMMA, at laser fluences below the ablation threshold is found to result in the formation of naphthalene-like and phenanthrene-like photoproducts, whereas above the threshold, additional photoproducts are clearly observed only in the case of the NapI dopant. The photolysis yields for both dopants exhibit very similar behaviour, increasing sharply above the threshold. In contrast, in the case where the dopants are embedded into the strongly absorbing polymer polystyrene, their photolysis yields reach a limiting value closely above the ablation threshold. Therefore, the absorbing polymer provides a high degree of control over the induced photochemical effects. The finding implies that the photolysis efficiency of the incorporated additives is directly affected by the host polymeric material.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Athanasia Athannassiou, D. Fragouli, Efi Andreou, Dmitrios Anglos, Savas K. Georgiou, and Costas Fotakis "Fundamental aspects of photochemical effects in UV laser ablation", Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); https://doi.org/10.1117/12.432834
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KEYWORDS
Polymers

Laser ablation

Photolysis

Luminescence

Ultraviolet radiation

Laser damage threshold

Polymethylmethacrylate

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