High Reflectance Mirrors For Extreme Ultraviolet (EUV) Space Instrumentation

W M Burton

doi:10.1117/12.966165

9 January 1984 High Reflectance Mirrors For Extreme Ultraviolet (EUV) Space Instrumentation

W M Burton

Proceedings Volume 0445, Instrumentation in Astronomy V; (1984) https://doi.org/10.1117/12.966165
Event: 1983 Astronomy Conferences, 1983, London, United Kingdom

Abstract

Many space astronomy instruments have used near-normal incidence reflecting mirror surfaces of aluminium protected by a thin coating of magnesium fluoride to give high reflectance at ultraviolet wavelengths. This type of coating has excellent performance for wavelengths longward of 1200 Å, but the extreme ultraviolet (EUV) reflectance at < 1200 Å is very low because the MgF2 overcoating becomes strongly absorbing in this wavelength region. This limitation, together with the related MgF2 detector window transmission limit, has resulted in a relative shortage of observational data in the astrophysically important spectral range 912 Å-1200 Å. While grazing incidence techniques can provide higher EUV reflectance values than normal incidence systems, they are less suitable for complex multi-element spectroscopic instruments. To obtain a high normal incidence reflectance in the spectral range Å< 1000 Å it will be necessary to use alternative reflecting surfaces without protective overcoatings. Possible mirror coating materials are discussed in this paper and a novel technique is proposed for producing high reflectance EUV mirrors, without absorbing overcoatings, for use in the space environment.

Citation Download Citation

W M Burton "High Reflectance Mirrors For Extreme Ultraviolet (EUV) Space Instrumentation", Proc. SPIE 0445, Instrumentation in Astronomy V, (9 January 1984); https://doi.org/10.1117/12.966165

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