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6 December 2001 Phase gratings made with inductively coupled plasma technology
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Inductively coupled plasma (ICP) equipment is a new advanced version of dry-etching equipment that has not been widely reported to produce micro-optical elements before. The obvious structural improvement of ICP over the usual widely-used Reactive Ion Etching (RIE) is that two Radio Frequency (RF) power sources are used in ICP, while only one RF power source is used in RIE. This structural improvement of ICP results in the features of high-density plasma, low pressure and good directionality of ions, thereby bringing us the advantages over RIE technology as the weaker surface damage, better vertical profile of the etched surface, smaller linewidth and more freedoms to control the etching process. In this paper we report our detailed experimental results of using the new ICP setup for producing micro-optical elements. Experimental results support the view that ICP is a new advanced version of dry etching equipment for producing micro-optical elements. Phase gratings made with ICP have wide applications in micro-optical elements and systems. It is believed that use of ICP is the new developing direction for fabrication of micro- optical elements and systems in the future.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Changhe Zhou, Peng Xi, Enwen Dai, Liren Liu, and Huayi Ru "Phase gratings made with inductively coupled plasma technology", Proc. SPIE 4470, Photonic Devices and Algorithms for Computing III, (6 December 2001);

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