B-Si masks for storage ring X-ray lithography

R. E. Acosta; J R Maldonado; L K. Towart; J M Warlaumont

doi:10.1117/12.939214

19 March 1984 B-Si masks for storage ring X-ray lithography

R. E. Acosta, J R Maldonado, L K. Towart, J M Warlaumont

Proceedings Volume 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology; (1984) https://doi.org/10.1117/12.939214
Event: 27th Annual Technical Symposium, 1983, San Diego, United States

Abstract

The fabrication of masks used in storage ring X-ray lithography is described. These masks consist of a gold absorber electroplated over a substrate formed by a thin boron-doped silicon membrane covered by a layer of polyimide. Measurement of the properties of the materials which are of concern in this application is also described.

Citation Download Citation

R. E. Acosta, J R Maldonado, L K. Towart, and J M Warlaumont "B-Si masks for storage ring X-ray lithography", Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); https://doi.org/10.1117/12.939214

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