Paper
28 September 2001 Addressable electrodes microarray for biological analysis system
Mihaela Ilie, Elena Cianci, Vittorio Foglietti, Antonio Minotti, Gianluca de Bellis, Giancarlo Caramenti
Author Affiliations +
Proceedings Volume 4560, Microfluidics and BioMEMS; (2001) https://doi.org/10.1117/12.443063
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States
Abstract
Multidisciplinary efforts, combining microfabrication, chemistry and molecular biology, have been recently focused on the development of large electrode arrays loaded with oligonucleotide probe to allow rapid analysis of nucleic acid samples. Different micromachining techniques can be used for obtaining the inlet, outlet and main reservoirs for the analyte. In the present work silicon wafers are used as substrates for the microarrays, patterned by means of direct writing or optical lithography. Three methods are developed in order to obtain reservoirs with depths ranging from 5 microns to 200 microns, allowing an analyte volume in the range of 1 nl to 1 ml: reactive ion etching of a polyimide layer, wet anisotropic etching of silicon, respectively deep wet isotropic etching of the glass cover. The glass cover is bonded at low temperature, using spin-on glass as adhesive and ensures a protection of the analyte, as well as a rapid entering of the analyte in the reservoirs, increasing thus the speed of the analysis. A custom laser induced fluorescence set-up is used in order to perform the analysis. The fluorescent DNA molecules are concentrated and localized during an observation time of 60 seconds, proving the functionality of the device.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mihaela Ilie, Elena Cianci, Vittorio Foglietti, Antonio Minotti, Gianluca de Bellis, and Giancarlo Caramenti "Addressable electrodes microarray for biological analysis system", Proc. SPIE 4560, Microfluidics and BioMEMS, (28 September 2001); https://doi.org/10.1117/12.443063
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KEYWORDS
Electrodes

Silicon

Glasses

Optical lithography

Wet etching

Chromium

Etching

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