2001 update on the SEMI Standards Mask Qualification Terminology Task Force

Rik M. Jonckheere

doi:10.1117/12.458299

11 March 2002 2001 update on the SEMI Standards Mask Qualification Terminology Task Force

Rik M. Jonckheere

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Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458299
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

At BACUS2000 this initiative towards a common use of terminology in photomask manufacturing and application, has been introduced. A proposed standard has been achieved for one-dimensional terminology, such as feature width uniformity, feature linearity, etc. The special approach of the document is that it includes a list of mandatory information to clarify a number given, e.g. as measurement result or as budget. The main target of the document is to serve as guideline for user-supplier communication in the field of photomasks. The present focus in the Task Force is on terminology for two-dimensional mask metrology. This includes corner rounding, line-end, shortening, edge roughness, etc. Such terms are already in use and described in literature, but a quantitative comparison is complicated without a full understanding of the technique and sample size used. In addition, the Task Force is discussing an approach by which the fidelity of a mask feature can be quantified. The challenge for use in benchmarking is to find a representative set of features. The suggested pattern fidelity quantification is a first step to allow an assessment of the printing performance of real reticles, taking limitations of the achieved pattern fidelity caused by the mask making process into account.

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Rik M. Jonckheere "2001 update on the SEMI Standards Mask Qualification Terminology Task Force", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458299

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