CARs blanks feasibility study results for the advanced EB reticle fabrication (IV)

Masahiro Hashimoto; Fumiko Ota; Yasunori Yokoya; Hideo Kobayashi

doi:10.1117/12.458350

11 March 2002 CARs blanks feasibility study results for the advanced EB reticle fabrication (IV)

Masahiro Hashimoto, Fumiko Ota, Yasunori Yokoya, Hideo Kobayashi

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458350
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

In order to provide a platform for the industry, we have been working on positive-working CAR screening by joint-works with resist-makers. In this paper, firstly, we did validation of a technique 'dark erosion analysis by excess develop' on our latest benchmark CAR C-2, to re-introduce our baking optimization technique to all the blanks users. The baking condition described by the technique (the sweet spot) certainly provided us a superior pattern profile, a longer blanks life, and better sensitivity stability for PEB time. To find a CAR that exceeds C-2 performance, we continued CAR screening. A CAR with 'less-footing' and 'high-sensitivity' was found, however, it had still a difficulty of terrible 'spray-damages' due to insufficient remaining thickness after develop. Desiccant (silica-gel) worked significantly to extend CAR blanks life, however, we found that it was not available for practical use unfortunately due to excess particle contamination during shipment. As a technique to solve 'spray-develop damage' issue, it was certainly effective to form a protection layer, and aqueous TAR over-coating layer could be an option to prevent resists film from the spray-damages. Finally, we reported negative-working CARs screening results. And some negative CARs were superior to the most popular one today for sensitivity or pattern profile, however, they had a difficulty of excess-undercut.

Citation Download Citation

Masahiro Hashimoto, Fumiko Ota, Yasunori Yokoya, and Hideo Kobayashi "CARs blanks feasibility study results for the advanced EB reticle fabrication (IV)", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458350

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