Cleaning of photomask substrates using CO2 snow

Werner V. Brandt

doi:10.1117/12.458340

11 March 2002 Cleaning of photomask substrates using CO₂ snow

Werner V. Brandt

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458340
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

CO₂ snow cleaning technology has demonstrated the ability to clean a variety of contamination types in a non damaging, environmentally friendly manner. CO₂ snow cleaning methods have been used to clean both particles and light organics and currently can be found in a variety of high tech industries to include, semiconductor (Si and GaAs), flat panel display, disk head and media manufacturing, and fiber optics. This paper offers an introduction to basic CO₂ properties and cleaning methods in general and photomask cleaning in particular. Focus will be placed on the CO₂ snow cleaning method to include: the snow making process, process parameters, process issues, contaminant types, CO₂ sources and specification, and safety. A new CO₂ snow system to clean current and next generation photomask substrates has been developed and is currently being tested. Machine specifics, process parameters, process issues, and cleaning data, will be discussed in detail.

Citation Download Citation

Werner V. Brandt "Cleaning of photomask substrates using CO₂ snow", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458340

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