Development of refined cleaning technique focusing on ecological viewpoint

Koji Tange; Yoshikazu Nagamura; Kunihiro Hosono; Yuki Oomasa; Koichi Kido; Atsushi Hayashi; Yasutaka Kikuchi; Ichiro Imagawa; Yuichi Matsuzawa; Hozumi Usui

doi:10.1117/12.458332

11 March 2002 Development of refined cleaning technique focusing on ecological viewpoint

Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yuki Oomasa, Koichi Kido, Atsushi Hayashi, Yasutaka Kikuchi, Ichiro Imagawa, Yuichi Matsuzawa, Hozumi Usui

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458332
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

We are focusing on a high-performance cleaning process with minimum use of chemicals. For the substitution of chemicals, the refined cleaning tools and process have been developed, which use the high-concentration ozonic together with hydrogen water. To optimize a cleaning process, we have evaluated the removal and decomposition efficiency of organic compounds on the mask surface, the optical degradation of Cr and Suicide materials and so on. In conclusion, the substitution of sulfuric acid, ammonia and other chemicals is available for practical cleaning process by combining their functional cleaning steps. Especially in the ArF generation, this cleaning technique was found to be promising for the reduction of optical-damage and chemical residues for mask patterns and as well as high-efficiency particle removal.

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Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yuki Oomasa, Koichi Kido, Atsushi Hayashi, Yasutaka Kikuchi, Ichiro Imagawa, Yuichi Matsuzawa, and Hozumi Usui "Development of refined cleaning technique focusing on ecological viewpoint", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458332

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