First performance data obtained on next-generation mask metrology tool

Gerhard W.B. Schlueter; Klaus-Dieter Roeth; John M. Whittey

doi:10.1117/12.458296

11 March 2002 First performance data obtained on next-generation mask metrology tool

Gerhard W.B. Schlueter, Klaus-Dieter Roeth, John M. Whittey

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458296
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Continually shrinking features sizes coupled with tighter tolerances for critical dimensions and feature placement necessitate development of new metrology tools that can meet the demand for more precision and accuracy during the measurement process. With this in mind Leica Microsystems has developed a next general metrology system that is capable of fulfilling both the feature placement and critical dimension metrology requirements. This paper contains a brief description of the new system hardware and design changes incorporated into the Leica LMS IPRO2 as well as recent measurement data indicative of initial tool performance.

Citation Download Citation

Gerhard W.B. Schlueter, Klaus-Dieter Roeth, and John M. Whittey "First performance data obtained on next-generation mask metrology tool", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458296

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