Partitioning of photomask processes for defects

Charles H. Howard; Russell Shoemake; Phillip Lim; Curt J. Linder

doi:10.1117/12.458318

11 March 2002 Partitioning of photomask processes for defects

Charles H. Howard, Russell Shoemake, Phillip Lim, Curt J. Linder

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458318
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Elimination of photomask defects requires identifying the sources of contaminants at each process step. Current industry practice is to perform defect inspection at the end of processing. This makes determining the source of defect generators extremely difficult. This paper presents data taken from inspections performed immediately following the principal processing steps done in photomask manufacture. The KLA-Tencor SLF27 TeraStar™ inspection tool was used to inspect a generic test pattern after developing, etching and stripping of the resist.

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Charles H. Howard, Russell Shoemake, Phillip Lim, and Curt J. Linder "Partitioning of photomask processes for defects", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458318

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