Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs

Gerhard W.B. Schlueter; Walter Steinberg; John M. Whittey

doi:10.1117/12.458314

11 March 2002 Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs

Gerhard W.B. Schlueter, Walter Steinberg, John M. Whittey

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Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458314
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

A new CD metrology system with 248 nanometer illumination is the subject of this paper. The system configuration and major component improvements is described. Test measurements on chrome-on-glass and attenuated phase shift masks were performed demonstrating improved CD linearity down to approximately 300 nm and long term repeatability performance in the 2 nm realm.

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Gerhard W.B. Schlueter, Walter Steinberg, and John M. Whittey "Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458314

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