Photomask blank shelf-life study on e-beam chemically amplified resists

Feng Qian; David Y. Chan; Masahiko Ishizuka; Akira Kurabayashi; Takumi Ogawa; Ryoichi Kobayashi; Takaei Sasaki

doi:10.1117/12.458337

11 March 2002 Photomask blank shelf-life study on e-beam chemically amplified resists

Feng Qian, David Y. Chan, Masahiko Ishizuka, Akira Kurabayashi, Takumi Ogawa, Ryoichi Kobayashi, Takaei Sasaki

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458337
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Fabrication of 130nm and below technology node photomasks favors EBeam chemically amplified resist (CAR) due to its higher sensitivity, contrast and resolution. However, chemically amplified resist is in general much more sensitive to the environment compared to conventional resists such as PBS and ZEP7000. Coated CAR blank shelf life will have a major impact on CD control of high-end photomask manufacturing especially for extended delay situations. This paper presents blank supplier packaging methods and rawstock storage conditions and their impact on CAR blank shelf life in the photomask fabrication facility. We selected one of the top chemically amplified e-beam resists for this study.

Citation Download Citation

Feng Qian, David Y. Chan, Masahiko Ishizuka, Akira Kurabayashi, Takumi Ogawa, Ryoichi Kobayashi, and Takaei Sasaki "Photomask blank shelf-life study on e-beam chemically amplified resists", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458337

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