Process optimization for particle removal on blank chrome mask plates in preparation for resist application

Stephen Osborne; Eryn Smith; Eric Woster; Anthony Pelayo

doi:10.1117/12.458347

11 March 2002 Process optimization for particle removal on blank chrome mask plates in preparation for resist application

Stephen Osborne, Eryn Smith, Eric Woster, Anthony Pelayo

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Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458347
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

As integrated circuits require smaller lines to provide the memory and processing capability for tomorrow's marketplace, the photomask industry is adopting higher contrast resists to improve photomask lithography. Photomask yield for several high-contrast resist recipes may be improved by coating masks at the mask shop. When coating at a mask shop, an effective method is available that uses coat/bake cluster tools to ensure blanks are clean prior to coating. Many high-contrast resists are available, and some are more susceptible to time-dependent performance factors than conventional resists. One of these factors is the time between coating and writing. Although future methods may reduce the impact of this factor, one current trend is to reduce this time by coating plates at the mask shop just prior to writing. Establishing an effective process to clean blanks prior to coating is necessary for product quality control and is a new task that is critical for maskmakers who previously purchased mask plates but have decided to begin coating them within their facility. This paper provides a strategy and method to be used within coat/bake cluster tools to remove particle contamination from mask blanks. The process uses excimer-UV ionizing radiation and ozone to remove organic contaminants, and then uses a wet process combined with megasonic agitation, surfactant, and spin forces. Megasonic agitation with surfactant lifts up particles, while the convective outflow of water enhances centripetal shear without accumulating harmful charge.

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Stephen Osborne, Eryn Smith, Eric Woster, and Anthony Pelayo "Process optimization for particle removal on blank chrome mask plates in preparation for resist application", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458347

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KEYWORDS

Particles

Photomasks

Coating

Photoresist processing

Acoustics

Molecules

Wave propagation

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