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11 March 2002 Slashing turnaround-time by introducing distributed computing
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Mask data preparation has become a major concern in the supply chain from design to the fab. The mask industry is facing a number of problems induced by a massive introduction of OPC. Affecting the design flow the exponentially escalating data volume came into focus because the data-prep infrastructure fails to keep up with this development. As a consequence the turn around time from tape out to 'ready to write' data is permanently rising from a couple of hours 2 years ago to many days/weeks nowadays. Computation times of many days on modern workstations is no exception anymore. Especially when mask data have to be converted to another writing tools data format or just a mask manufacturing process has to be adapted by modifying the data bias, we encountered computing times of more than hundred hours for a single layer. We found a way to reduce these computation times by a factor of more than 100 by introducing distributed computing on a Linux based cluster.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerd Ballhorn "Slashing turnaround-time by introducing distributed computing", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002);

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