Thin film stress control of absorber stack materials for EUVL reticles

James R. Wasson; Diana Convey; Pawitter J. S. Mangat; D. Frank Bazzarre; Lubomir Parobek

doi:10.1117/12.458257

11 March 2002 Thin film stress control of absorber stack materials for EUVL reticles

James R. Wasson, Diana Convey, Pawitter J. S. Mangat, D. Frank Bazzarre, Lubomir Parobek

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458257
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Extreme ultraviolet lithography (EUVL) is the leading candidate for next generation lithography with the potential for extendibility beyond the 50-nm node. The three-layer absorber stack for EUVL reticles consists of an absorber, repair buffer and etch-stop layers, while a two-layer absorber stack eliminates the etch-stop layer. A portion of the mask pattern distortion can be assigned to the absorber stack's film stress. Ideally, the absorber stack films would have zero stress uniformly across the mask, which would produce zero pattern distortion when the films were removed during the pattern transfer processes. Maintaining adequate thin film stress control and uniformity relies on accurate thin film thickness measurements. The thin film deposition parameters can have a significant influence on the metrology technique's ability to measure the thin film's thickness. We have studied resistive and photonic metrology techniques for absorber stack thin film thickness measurement and stress control.

Citation Download Citation

James R. Wasson, Diana Convey, Pawitter J. S. Mangat, D. Frank Bazzarre, and Lubomir Parobek "Thin film stress control of absorber stack materials for EUVL reticles", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458257

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE