Using high-resolution (0.13 um) UV-based reticle inspection for CD uniformity in incoming quality control

Ernesto Villa; Emanuele Baracchi; Anja Rosenbusch; Michael M. Har-zvi; Gidon Gottlib

doi:10.1117/12.458308

11 March 2002 Using high-resolution (0.13 μm) UV-based reticle inspection for CD uniformity in incoming quality control

Ernesto Villa, Emanuele Baracchi, Anja Rosenbusch, Michael M. Har-zvi, Gidon Gottlib

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458308
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

The paper presents the use of the Linewidth Bias Monitor (LBM), the critical dimension (CD) uniformity mapping option of the ArisTM21i die-to-database mask inspection system, for mask process control and incoming quality control (IQC) in the wafer fab. LBM is qualified for this purposes by baselining it with CD measurements. Masks, provided by different commercial vendors, are evaluated based on the LBM maps obtained during mask inspection. Mean-to-target and 3-sigma values are evaluated and compared. The results are presented. In addition, a case, where LBM identified a killer CD variation during IQC is presented.

Citation Download Citation

Ernesto Villa, Emanuele Baracchi, Anja Rosenbusch, Michael M. Har-zvi, and Gidon Gottlib "Using high-resolution (0.13 μm) UV-based reticle inspection for CD uniformity in incoming quality control", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458308

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