Surface And Gas Processes In Photodeposition In Small Zones

J Y Tsao; D J Ehrlich

doi:10.1117/12.939427

14 June 1984 Surface And Gas Processes In Photodeposition In Small Zones

J Y Tsao, D J Ehrlich

Proceedings Volume 0459, Laser-Assisted Deposition, Etching, and Doping; (1984) https://doi.org/10.1117/12.939427
Event: 1984 Los Angeles Technical Symposium, 1984, Los Angeles, United States

Abstract

The kinetics of processes for laser-photochemically depositing localized thin films are discussed, both in the low-intensity regime, where photoreactions are rate limiting, and in the high-intensity regime, where mass transport is rate limiting. Comparisons are made between processes relying on gas-phase and surface-phase photochemistry. Examples are given of recent studies of photoreactions confined entirely to surface phases, and preliminary results of experiments performed in the mass-transport-limited regime are reported.

Citation Download Citation

J Y Tsao and D J Ehrlich "Surface And Gas Processes In Photodeposition In Small Zones", Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); https://doi.org/10.1117/12.939427

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available