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21 November 2001 Fabrication of high-aspect-ratio precision MEMS with LIGA using synchrotron radiation
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Abstract
LIGA is a microfabrication technology that enables the fabrication of ultraprecise deep microstructures, from hundreds to thousands of micrometers thick, with lateral dimensions in the micrometer range, and submicron tolerances in a variety of materials. It is a sequence of process steps combining deep X-ray lithography, plating-through-mask and replication. The first step of deep lithography in thick resist using synchrotron radiation will be emphasized. The replication techniques extend the applicability of LIGA by offering a broad spectrum of materials but also by allowing for low-cost volume application. Key technological areas receiving attention are materials base expansion, multi-level processing, formation of complex shapes, and assembly.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chantal G. Khan Malek "Fabrication of high-aspect-ratio precision MEMS with LIGA using synchrotron radiation", Proc. SPIE 4592, Device and Process Technologies for MEMS and Microelectronics II, (21 November 2001); https://doi.org/10.1117/12.448957
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