Paper
29 October 2001 Polishing micro-optic components for use in photonic systems
Irene M. Peterson
Author Affiliations +
Proceedings Volume 4595, Photonic Systems and Applications; (2001) https://doi.org/10.1117/12.446635
Event: International Symposium on Photonics and Applications, 2001, Singapore, Singapore
Abstract
A fundamental understanding of the mechanisms and variables involved in mechanical and chemical material removal can reduce the trail and error involved in designing a polishing schedule. This paper summarizes some key results from the literature on the relationship between damage mechanisms, removal rates, materials properties and polishing machine variables. A case history on development of a schedule for fiber polishing illustrates some practical examples of the challenges encountered, and also discusses the effects of different abrasive materials.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Irene M. Peterson "Polishing micro-optic components for use in photonic systems", Proc. SPIE 4595, Photonic Systems and Applications, (29 October 2001); https://doi.org/10.1117/12.446635
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polishing

Abrasives

Surface finishing

Glasses

Particles

Diamond

Oxides

RELATED CONTENT

New approach for pre-polish grinding with low subsurface damage
Proceedings of SPIE (September 27 2011)
Nanometer accurate shaping with fluid jet polishing
Proceedings of SPIE (December 27 2001)
Sapphire fabrication for precision optics
Proceedings of SPIE (November 11 1996)
Finishing Tubular Diamond Turned Optics
Proceedings of SPIE (February 13 1987)
Workpiece roughness and grindability
Proceedings of SPIE (November 01 1997)

Back to Top