Characterization of pulsed-laser deposited BaTiO3 thin films

Jie Xu; Daniel P. Durisin; Qian Zhao; Gregory W. Auner

doi:10.1117/12.469825

10 June 2002 Characterization of pulsed-laser deposited BaTiO₃ thin films

Jie Xu, Daniel P. Durisin, Qian Zhao, Gregory W. Auner

Proceedings Volume 4647, Functional Integration of Opto-Electro-Mechanical Devices and Systems II; (2002) https://doi.org/10.1117/12.469825
Event: Symposium on Integrated Optoelectronic Devices, 2002, San Jose, California, United States

Abstract

BaTiO₃ thin films were grown on Si (100) and UV transparent fused silica substrates by KrF (248 nm) excimer laser deposition. The analysis of thin films was performed using XRD, AFM, UV/VIS/NIR spectrometer and Nano-indenter to study general features of BaTiO₃ thin films and to optimize deposition parameters. The XRD spectra of BaTiO₃ films at 600 degree(s)C on Si (100) show polycrystalline peaks with a strongly preferential orientation. The surface imaging was taken by AFM and shows obvious grain boundary structures. The transmittance spectra for BaTiO₃ films on UV fused silica were measured. The absorption increases rapidly below 380 nm. The effects of changing background O₂ gas pressure and substrate temperature were studied. Finally, the hardness and Young's reduced modulus and scratch test of BaTiO₃ films were measured using Nano-indenter system.

Citation Download Citation

Jie Xu, Daniel P. Durisin, Qian Zhao, and Gregory W. Auner "Characterization of pulsed-laser deposited BaTiO₃ thin films", Proc. SPIE 4647, Functional Integration of Opto-Electro-Mechanical Devices and Systems II, (10 June 2002); https://doi.org/10.1117/12.469825

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