Florinated polyimide for low-loss optical waveguides at 1.55 um

Shigeki Sakaguchi; Yoshihiro Moroi; Hidehisa Nanai; Takashi Hayamizu; Yuji Yamamoto; Kazuhiko Maeda

doi:10.1117/12.469654

7 June 2002 Florinated polyimide for low-loss optical waveguides at 1.55μ m

Shigeki Sakaguchi, Yoshihiro Moroi, Hidehisa Nanai, Takashi Hayamizu, Yuji Yamamoto, Kazuhiko Maeda

Proceedings Volume 4653, WDM and Photonic Switching Devices for Network Applications III; (2002) https://doi.org/10.1117/12.469654
Event: Symposium on Integrated Optoelectronic Devices, 2002, San Jose, California, United States

Abstract

Fluorinated polyimide (FPI) is an attractive material for fabricating low-loss optical waveguides at 1.55 micrometers , because of its superior optical and thermal properties. Although FPI planar lightwave circuits (PLCs) are usually fabricated on silicon substrate, such PLCs exhibit relatively high polarization dependence and high transmission loss compared with those of silica PLCs. Use of an FPI substrate overcomes these problems that mainly originate from the difference in thermal expansion coefficient between FPI and silicon. It improves the optical property of FPI waveguides, e.g., the transmission loss and polarization dependent loss for straight waveguides reduce to less than 0.3 dB/cm and 0.1 dB, respectively, in the 1.55-micrometers band. The use of FPI substrates will enable the fabrication of high-optical-quality FPI PLCs such as 1x8 splitters.

Citation Download Citation

Shigeki Sakaguchi, Yoshihiro Moroi, Hidehisa Nanai, Takashi Hayamizu, Yuji Yamamoto, and Kazuhiko Maeda "Florinated polyimide for low-loss optical waveguides at 1.55μ m", Proc. SPIE 4653, WDM and Photonic Switching Devices for Network Applications III, (7 June 2002); https://doi.org/10.1117/12.469654

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