Paper
28 March 2002 Microstructure and optical properties of Ge(Si) dots grown on Si
Jun Wan, Song Tong, Zhimei Jiang, Gaolong Jin, Y. H. Luo, Jian-Lin Liu, Xiaozhou Liao, Jin Zou, Kang Lung Wang
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Abstract
The microstructural, luminescence properties and photoresponse of multilayer Ge(Si) quantum dots grown on Si (100) substrates are studied. The strain and composition of the dots are studied by synchrotron-radiation x-ray. The dots are found to be Si0.58Ge0.42 alloy with 50% strain relaxed in average. The photoluminescence from the dots is observed up to room temperature. The thermal stability of the quantum dots is studied. P-i-n structures are grown with Ge(Si) dots embedded in the i-layer for photodetection investigation. The photoresponse wavelength of Ge(Si) dots covers the wavelength range of 1.3-1.52 mm and relatively high external quantum efficiency is obtained.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun Wan, Song Tong, Zhimei Jiang, Gaolong Jin, Y. H. Luo, Jian-Lin Liu, Xiaozhou Liao, Jin Zou, and Kang Lung Wang "Microstructure and optical properties of Ge(Si) dots grown on Si", Proc. SPIE 4656, Quantum Dot Devices and Computing, (28 March 2002); https://doi.org/10.1117/12.460805
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KEYWORDS
Silicon

Germanium

Quantum dots

X-ray diffraction

Luminescence

Grazing incidence

Optical properties

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